ION PRODUCTION METHOD AND ION SOURCE IMPLEMENTING IT Russian patent published in 1997 - IPC

Abstract RU 2095877 C1

FIELD: ion engineering. SUBSTANCE: to produce ion beam, plasma is generated in discharge space by exciting eddy-free electrical component of high-frequency field and axially symmetrical stationary magnetic field in it which is heterogeneous and falling to symmetry axis of discharge space. Inherent electrostatic waves are excited in generated plasma by selecting flux density of stationary magnetic field in discharge space, power, and frequency of high-frequency field at desired ion current density. EFFECT: improved efficiency of ion beam production characterized by energy and gas efficiency of ion source implementing this method due to more effective use of high-frequency power introduced in discharge chamber. 17 cl, 6 dwg

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RU 2 095 877 C1

Authors

Aleksandrov A.F.

Antonova T.B.

Bugrov G.Eh.

Vorob'Ev N.F.

Kondranin S.G.

Kral'Kina E.A.

Obukhov V.A.

Popov G.A.

Rukhadze A.A.

Dates

1997-11-10Published

1995-06-19Filed