PROCESS OF GENERATION OF ION BEAM Russian patent published in 1995 - IPC

FIELD: vacuum-plasma treatment of tools. SUBSTANCE: vacuum-arc discharge is ignited in discharge space of vacuum chamber with integrated-cold cathode which includes separated metal-halogen and gaseous stages. Emission grid is positioned in zone of gaseous stage of discharge. Negative potential is fed to grid and into zone of working space of vacuum chamber after ignition of discharge arc. Metal-halogen stage of the latter is isolated from working space of chamber. In addition magnetic field which lines of force are located in planes perpendicular to direction of discharge current and have direction ensuring displacement of discharge channel towards grid are formed in zone of column of gas plasma. EFFECT: improved efficiency of vacuum-plasma treatment. 7 cl, 5 dwg