PLASMA ION SOURCE Russian patent published in 1997 - IPC

Abstract RU 2083020 C1

FIELD: electronic engineering and analytical chemistry. SUBSTANCE: plasma ion source has discharge chamber with inlet slot and device arranged along its central axis through insulator and used to feed working material made in the form of capillary tube. High-voltage supply is connected to capillary tube and to chamber. EFFECT: improved sensitivity of analysis of liquids and gases, simplified hardware and reduced cost. 1 dwg

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RU 2 083 020 C1

Authors

Sikharulidze G.G.

Lezhnev A.E.

Dates

1997-06-27—Published

1994-06-16—Filed