FIELD: microelectronics. SUBSTANCE: proposed plasma source used for cathodic spraying of substances and also for elemental high-sensitivity solid-state analysis in mass-spectrometry using glow discharge method has discharge chamber that functions at the same time as anode and hollow cathode carrying specimen. Hole is made on hollow cathode top and outlet hole for driving out ions is disposed opposite to that hole along hollow-cathode center axis in discharge chamber. Gas is introduced inside hollow cathode through capillary tube provided for the purpose. Hollow cathode has its top contracted to 10 - 90% of its diameter. Plasma density in discharge chamber is reduced due to lower pressure of plasma-forming gas pressure which makes it possible to reduce desorption intensity of pollutants from surfaces of discharge-chamber parts. EFFECT: enhanced efficiency and capacity of ion source in analyzing solid bodies. 2 cl, 2 dwg
