METHOD FOR DEPOSITING COATS BY CENTRIFUGING Russian patent published in 1997 - IPC

FIELD: semiconductor engineering; coating plates with photoresist or other materials. SUBSTANCE: for shaping photoresist layer, some portion of solution is deposited on plate rotating at speed of 5000-7000 rpm and after entire surface of plate is covered with solution, uniform layer is formed within 10-15 s while varying plate rotation speed obeying law ω = A/t,, where t is time since beginning of deposition; ω is angular velocity of plate rotation; A is experimental constant depending on physical properties of photoresist, viscosity, and the like. EFFECT: improved uniformity of coat. 2 dwg , 1 tbl