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2 136 077

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C1

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IPC

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Application

98101021/25, 1998-01-22

(24)

Start date

1998-01-22

(22)

Actual filing date

1998-01-22

(45)

Published

1999-08-27

(72)

Inventor

Abramov G.V.Bitjukov V.K.Volodin R.A.Popov G.V.

(73)

Holder

Voronezhskaja Gosudarstvennaja Tekhnologicheskaja Akademija

METHOD FOR PRODUCING PHOTORESIST COATINGS Russian patent published in 1999 - IPC

Abstract RU 2136077 C1

FIELD: microelectronics. SUBSTANCE: method involves coating substrate with some portion of photoresist and forming layer by rotating the substrate. During layer formation, analyzed section on reference plate is illuminated after three to five revolutions by bundle of parallel monochromatic rays, and time between maximums of intensity of light reflected from reference plate is recorded; this time is maintained during coating working plate with photoresist while varying angular velocity in proportion to ratio of respective time intervals between maximums of reflected light intensity for working and reference plates. EFFECT: improved reproducibility of layer obtained. 1 dwg, 1 tbl

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RU 2 136 077 C1

Authors

Abramov G.V.

Bitjukov V.K.

Volodin R.A.

Popov G.V.

Dates

1999-08-27—Published

1998-01-22—Filed

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