Patenton — panteon of patents

(19)

RU

(11)

2 157 509

(13)

C1

(51)

IPC

(21) (22)

Application

99105912/28, 1999-03-24

(24)

Start date

1999-03-24

(22)

Actual filing date

1999-03-24

(45)

Published

2000-10-10

(72)

Inventor

Abramov G.V.Bitjukov V.K.Erygin D.V.Popov G.V.

(73)

Holder

Voronezhskaja Gosudarstvennaja Tekhnologicheskaja Akademija

METHOD TESTING THICKNESS OF FILM IN PROCESS OF ITS DEPOSITION Russian patent published in 2000 - IPC

Abstract RU 2157509 C1

FIELD: instrumentation, nondestructive test of thickness of films. SUBSTANCE: invention is related to devices measuring and testing thickness of films of photoresist deposited on rotating semiconductor substrate in process of centrifugation in the course of photolithography operations. In agreement with invention radiation beam with wave length λ is incident on tested substrate at angle ϕ, intensity of reflected radiation is recorded before and in process of deposition of film. In this case moment of finish of process of formation of thickness of photoresist film during centrifugation is determined by termination of change of intensity of reflected radiation in time and film thickness if found by mathematical expression given in description. EFFECT: possibility of test and measurement of thickness of photoresist film in process of its formation by centrifugation and of determination of moment of termination of formation of film thickness. 4 dwg

Similar patents RU2157509C1

Title Year Author Number
METHOD TESTING THICKNESS OF FILM IN PROCESS OF ITS DEPOSITION AND DEVICE FOR ITS REALIZATION 1999
  • Abramov G.V.
  • Bitjukov V.K.
  • Erygin D.V.
  • Popov G.V.
 RU2158897C1
METHOD FOR PRODUCING PHOTORESIST COATINGS 1998
  • Abramov G.V.
  • Bitjukov V.K.
  • Volodin R.A.
  • Popov G.V.
 RU2136077C1
METHOD AND DEVICE FOR PRODUCING PHOTORESIST COATING 1999
  • Abramov G.V.
  • Bitjukov V.K.
  • Kovalenko V.B.
  • Popov G.V.
 RU2158987C1
METHOD FOR DEPOSITING COATS BY CENTRIFUGING 1994
  • Abramov G.V.
  • Bitjukov V.K.
  • Popov G.V.
  • Ryzhkov V.V.
 RU2094903C1
METHOD AND DEVICE FOR COOLING DOWN SEMICONDUCTOR WAFERS 1999
  • Abramov G.V.
  • Bitjukov V.K.
  • Kovalenko V.B.
  • Popov G.V.
 RU2153209C1
CHAMFERING DEVICE FOR FINISHING SEMICONDUCTOR PLATES 2000
  • Abramov G.V.
  • Bitjukov V.K.
  • Grebenkin O.M.
  • Popov G.V.
 RU2163408C1
GEAR TO TAKE OFF CHAMFER IN PROCESS OF FINISHING TREATMENT OF SEMICONDUCTOR PLATE 2000
  • Abramov G.V.
  • Bitjukov V.K.
  • Grebenkin O.M.
  • Popov G.V.
 RU2168796C1
DYNAMIC-SINGLE-MODE LASER SYSTEM 1998
  • Antipov O.L.
  • Basiev T.T.
  • Gavrilov A.V.
  • Kuzhelev A.S.
  • Smetanin S.N.
  • Fedin A.V.
 RU2157035C2
PLATE POSITIONING DEVICE 1997
  • Abramov G.V.
  • Bitjukov V.K.
  • Nazina L.I.
  • Popov G.V.
 RU2131155C1
SEMICONDUCTOR WAFER COOLING DEVICE 2001
  • Abramov G.V.
  • Bitjukov V.K.
  • Kovalenko V.B.
  • Popov G.V.
 RU2193258C2

RU 2 157 509 C1

Authors

Abramov G.V.

Bitjukov V.K.

Erygin D.V.

Popov G.V.

Dates

2000-10-10—Published

1999-03-24—Filed

read Similar patents