FIELD: metallurgy. SUBSTANCE: device is provided with vacuum resistors. Vacuum chamber 1 has vacuum compartment 6 separated from chamber 1 by vacuum resistors. Electron gun 9 has system of cathodes which ensure formation of at least two electron beams. It is mounted in vacuum compartment 6 to direct electron beams through vacuum resistors to zone accommodating the solid body in order to maintain process of its evaporation and to zone of article being machined in order to maintain plasma formation process, respectively. EFFECT: efficient application of coating. 4 cl, 2 dwg
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