DEVICE FOR CLEANING ARC EVAPORATOR PLASMA FROM MICROPARTICLES (OPTIONS) Russian patent published in 1997 - IPC

FIELD: plasma engineering. SUBSTANCE: device is, essentially, louver set of electrodes placed on the path of plasma flow and connected to positive lead of voltage supply whose second lead is connected to anode of arc evaporator. Louver electrodes are made in the form of permanent magnets with conducting coating whose ends on both sides of set of louvers are closed with protective shields electrically isolated from louvers. In second option, permanent magnets of same shape as louver electrodes are arranged outside set of louvers. In either option, set of louvers may be built up of plain-parallel or coaxial conical electrodes. Coaxial set provides for axis-symmetrical cleaned and diverging or focused plasma flow. EFFECT: improved design. 3 cl, 5 dwg