FIELD: plasma deposition of coats. SUBSTANCE: gear cleaning plasma of arc evaporator from microparticles is meant for improvement of quality of coats deposited with the aid of vacuum-arc evaporators. It includes shutter system of electrodes so inclined to axis of evaporator that electrodes completely overlap aperture of evaporator. Electrodes are electrically connected in series and opposition and are linked to source of electric energy. Source of bias voltage connected with positive lead-out shutter system of electrodes is placed between this system and anode of evaporator to enhanced transparence of system. Electrodes may be built up from set of conductors connected in series and in aiding in one plate and in opposition in adjacent plates which diminishes value of current let pass through system. In evaporators having larger working surface of cathode shutter plates of system are arranged at different angles to axis of evaporator. Shutter plates bent over width in the form of part of cylindrical surface or in the form of two planes joined at obtuse angle have larger transparence. EFFECT: improved quality of deposited coats. 4 cl, 7 dwg
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Authors
Dates
1998-04-10—Published
1996-04-23—Filed