FACILITY FOR APPLYING THIN-FILM COATINGS Russian patent published in 1999 - IPC

Abstract RU 2138094 C1

FIELD: plasma engineering; coating large-area sheets of insulating materials. SUBSTANCE: unit comparing mean values of power and rate of current and voltage variation with reference signals is introduced in power system of magnetron phytosystem. Its output is connected to current interrupter and, through delay line, to starting device of adjustable regulated- voltage supply. When using phytosystem with small working chamber for coating large-area sheets, it will be good practice to make output sluice chamber in the form of blind pocket. For multiple-cathode phytosystems with long working chamber, multichannel gas admission system is used to pass gas through injection holes spaced maximum 100 cm apart. When such working chamber is divided by diaphragms into separate compartments and injection holes in each compartment are connected to separate gas admission system, such arrangement can apply multilayer coats simultaneously. Ionic cleaning functions are implemented by means of electrodes installed in sluice camber and connected to additional high-voltage supply. The latter may be of pulse type. EFFECT: provision for avoiding transfer of glow discharge into arc discharge thereby preventing failure of facility and coatings. 6 cl, 4 dwg

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RU 2 138 094 C1

Authors

Anan'In P.S.

Asainov O.Kh.

Zubarev S.M.

Krivobokov V.P.

Kuz'Min O.S.

Dates

1999-09-20Published

1997-02-04Filed