MAGNETRON SPUTTERING SYSTEM Russian patent published in 2000 - IPC

FIELD: plasma engineering. SUBSTANCE: magnetron spattering system used for covering surfaces of solid bodies, mainly sheet materials, with thin films has anode that functions as system case, cathode assembly, and holder for material being treated. Cathode assembly is, essentially, magnetic unit closed with flat sputtering target for starting glow discharge between cathode assembly and anode. Magnetic unit of proposed system is made in the form of magnetically permeate structure whose space between ribs is filled with permanent magnets. Such design of magnetic unit provides for starting glow discharge at minimum two sides each being closed with flat sputtering target. Holder for parts being treated may be installed on each (or any) side of magnetic unit where glow discharge can be started. EFFECT: improved capacity of system without increasing its size and weight. 2 dwg