PROCESS OF WET CHEMICAL TREATMENT OF DISC PREFORMS Russian patent published in 1997 - IPC

Abstract RU 2099812 C1

FIELD: microelectronics. SUBSTANCE: process relates to wet chemical treatment of semiconductor discs. Preforms of semiconductor material are treated by washing in treating medium saturated with gas that presents liquid with gas bubbles homogeneously dispersed in it. EFFECT: enhanced efficiency of process. 4 cl, 2 dwg , 1 tbl

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RU 2 099 812 C1

Authors

Maks Shtadler[De]

Gjunter Shvab[De]

Peter Romeder[De]

Dates

1997-12-20—Published

1994-05-12—Filed