FIELD: coating.
SUBSTANCE: invention relates to a plasma film coating technology and can be used in electronic, tool, optical, mechanical engineering and other industries. Apparatus comprises a louvre system configured as a set of electrodes spanning aperture of evaporator. Electrodes are electrically interconnected in series and in opposition and are connected to a current source and to positive terminal of voltage source, and by second terminal to anode of arc evaporator. Each electrode is formed from two contiguous elements which are connected to power source so that current flows through them in opposite directions.
EFFECT: technical result is improved performance by increasing total plasma stream at output of plasma filter.
1 cl, 2 dwg
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