METHOD AND DEVICE FOR PULSE-PERIODIC ION TREATMENT OF ARTICLE Russian patent published in 1994 - IPC

FIELD: solid-state physics. SUBSTANCE: relation between periods of discharge and accelerating pulses τ_d and τ_ac correspondingly is chosen depending on kind of accelerated ions, energy of material and plasma concentration according to equation , where f is ionization degree of vapors of material of cathode, S is coefficient of sputtering of the sample by accelerating ions, n_p is plasma concentration at source output, n_c is plasma concentration at surface of collector-sample. Sizes of grid cell and distance between cathode and grid are also chosen. As a result, high-concentration impurity may be achieved in the sample excluding additional inclusions. EFFECT: improved precision; simplified system for controlling implantation source. 2 dwg