METHOD AND DEVICE FOR GENERATING HOMOGENEOUS PLASMA WITH LARGE WORKING AREA BASED ON DISCHARGE IN HIGH-FREQUENCY OR MICROWAVE RANGE (OPTIONS) Russian patent published in 1998 - IPC

FIELD: plasma engineering. SUBSTANCE: method involves installation of waveguide structure (antenna) inside vacuum chamber and excitation of surface wave along it. Plasma generating device has plasma generating assembly with its basic part (antenna) built up of single conductor whose geometry follows shape of surface under treatment or of one or more long conductors of small cross-sectional area. Device efficiently transfers discharge energy in high-frequency or microwave range in absence of external magnetic field and also ensures low- intensity electric field near surfaces under treatment so as to confine this field around antenna. Device produces surface waves propagating along antenna-plasma boundary. Ion energy can be increased by means of auxiliary ac generator connected to substrate holder. EFFECT: facilitated procedure, improved design of device. 24 cl, 17 dwg