FIELD: materials engineering.
SUBSTANCE: invention relates to a method for producing charged particles and can be used, in particular, for technological processing of the surface of products. The method includes supplying a working medium to gas-discharge chamber 1 made of electrically conductive material, ionizing the working medium by introducing high-frequency electromagnetic energy through inductor 2. The inductor is located inside gas-discharge chamber 1 and connected to high-frequency generator 3 through capacitors 4. The method provides for connecting power source 5 to emission electrode 6 of ion-optical system 7, connecting power source 8 of opposite polarity to accelerating electrode 9 of ion-optical system 7, grounding or connecting to a contact with zero potential of electrode 10 of the ion-optical system, and removing charged particles from the volume of gas-discharge chamber 1. Moreover, the gas-discharge chamber has the walls made of electrically conductive material, and the inductor for inputting high-frequency electromagnetic energy is located inside the gas-discharge chamber, and capacitors are included in the electrical circuit between the inductor and the high-frequency generator.
EFFECT: expanded range of used working media and materials of the gas-discharge chamber, ability to use gas-discharge chambers of a wider range of volumes, improved stability of the source of charged particles.
4 cl, 2 dwg
Title | Year | Author | Number |
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HIGH-FREQUENCY PLASMA SOURCE | 2022 |
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Authors
Dates
2023-12-05—Published
2023-02-27—Filed