FIELD: ion-plasma technology of treatment of solid body surface; applicable in improvement and imparting of required electrophysical, chemical and mechanical properties of surfaces of articles from metals and alloys, semiconductors, dielectrics, superconductors and other materials. SUBSTANCE: method includes installation of treated part into working chamber, giving rise to vacuum, initiation of discharge in pulse regime in discharge gap, and various types of part surface treatment are effected in preset sequence by pulse ion-plasma fluxes and/or pulse fluxes of neutral partition. Upon completion of one type of surface treatment, transition to other type of discharge is accomplished, and respective treatment of surface is made. In surface treatment, in each type of discharge, value of discharge power density is selected in numerical interval in which dependence of treatment process rate on power density is not linear. Used pulse discharges are combined, time of pulse rise is not in excess of 10-15% of full pulse duration. Method provides for performance of various types of part surface treatment in any preset sequence, optimization of type of discharge in pulse regime and required power density for each type of surface treatment. EFFECT: considerable increase of treatment rate for unit of power consumption, higher quality of treatment and efficiency of production process control. 5 cl, 4 dwg, 2 ex
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Authors
Dates
2001-01-10—Published
1999-03-29—Filed