TRICHLOROSILANE PRODUCTION PROCESS Russian patent published in 2000 - IPC

Abstract RU 2147292 C1

FIELD: silicon compounds technology. SUBSTANCE: process involves activation of silicon tetrachloride-hydrogen interaction by high-energy (0.5-2.5 MeV) electron beam in flow-type reactor containing tetrachloride-hydrogen gas-vapor mixture or any worked-out gas-vapor mixtures containing silicon tetrachloride. EFFECT: reduced power consumption. 2 cl, 4 ex

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RU 2 147 292 C1

Authors

Reznichenko M.F.

Kuchumov B.M.

Kuznetsov F.A.

Kuksanov N.K.

Muravitskij S.A.

Lavrukhin A.V.

Korchagin A.I.

Borisova L.A.

Dates

2000-04-10Published

1999-02-18Filed