FIELD: continuous treatment of granular materials. SUBSTANCE: device used for continuous treatment of granular material includes stationary reactor with taper chute-like base to which material is fed and is treated in suspended layer by means of gas which is introduced via central gas receiver into bottom portion of reactor; gas thus introduced flows upward; material is discharged through hole available in bottom portion of reactor. Sizes, working parameters of reactor or volumes of connected devices are selected and adjusted in such way that layer is pulsating in reactor downward and upward at amplitude when amount of material in layer corresponds to that fed anew; layer is located in the lowest position; layer is fed to zone where velocity of gas flow is below minimum level required for bringing articles in suspended state, thus falling from reactor through flow of gas. EFFECT: possibility of maintaining required amount of material in reactor. 13 cl, 2 dwg
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Authors
Dates
2000-05-27—Published
1996-12-17—Filed