FIELD: aviation and power turbine engineering; applicable in ionic etching for control of macrostructure, precision removal of surface layers, or improvement of service characteristics of materials. SUBSTANCE: method includes preliminary cleaning of article surface, installation in zone of treatment of article and current-conducting material, evacuation of article treatment zone, application of negative potential to article and separately to current-conducting material, initiation on current-conducting material of vacuum arc arcing in vapors of this material with formation of plasma, treatment of surface by method of ionic etching by selection of current of vacuum arc on current-conducting material, and negative potential above 300 V to article so as to ensure article surface temperature of no more temperature of beginning of article material softening, or beginning of thermal diffusion of plasma elements of current-conducting material into surface of article material. EFFECT: increased etching rate, excluded change of properties of article material due to accumulation of ions of current-conducting material in surface layer. 3 cl, 1 tbl
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Authors
Dates
2001-04-20—Published
1999-05-27—Filed