METHOD AND DEVICE FOR CLEANING GASES, PRIMARILY INERT GASES, FROM IMPURITIES Russian patent published in 2001 - IPC

FIELD: production of clean gases. SUBSTANCE: method uses simultaneous longitudinal and transversal separation of impurities from clean gas under non-equilibrium gas-discharge plasma conditions. Clean gas is continuously passed through discharge chamber wherein DC or pulse-periodic voltage is applied to electrodes mounted inside chamber. Process is conducted at voltage ensuring maintenance of non-equilibrium plasma; in the process volumetric separation of gases occurs in discharge chamber both in longitudinal and transversal directions. Impurities-enriched and clean gases are extracted in vicinity of highest concentration of these gases, respectively. Shell is coaxially arranged around chamber. Chamber wall has holes for discharging impurities-enriched gases to space formed between chamber and shell walls. Pipe union for discharging impurities- enriched gas is installed in vicinity of point of its accumulation and that for admitting clean gas is connected to cathode; clean-gas outlet union is connected to anode. Volume of space formed between shell and chamber walls, diameter and number of holes in chamber wall increase from positive- to negative-polarity electrode. EFFECT: enhanced capacity and efficiency of gas cleaning. 4 cl, 1 dwg