INSTALLATION FOR PLASMA DEPOSITION Russian patent published in 2002 - IPC

FIELD: processes for applying gasothermic coatings. SUBSTANCE: installation includes heat- and insulated chamber with port through which in chamber are introduced: actuating device of mechanism for oscillation motion of plasmatron whose hollow shaft is joined with drive of mechanism for oscillation motion of plasmatron; carriage and drive unit for its reciprocation motion along guides; movable shield with opening closing port of chamber; drive unit for rotating part. Installation includes in addition hollow tie rod and guide for it made in carriage and passing through opening of shield in such a way that said tie rod is introduced into chamber. One end of tie rod is rigidly joined with nut of subsidiary screw transmission whose lead screw is mounted in bearing assemblies on carriage in parallel relative to tie rod axis and it is kinematically joined with drive for reciprocation motion of tie rod. Another end of tie rod is placed in its guide. Telescopic shaft is arranged inside tie rod, said shaft is formed by hollow shaft of mechanism for oscillation motion of plasmatron and additionally mounted shaft whose one end is joined with hollow shaft with possibility of axial motion and whose other end is mounted in bearing assembly on tie rod and joined with plasmatron. Movable shield is in the form of flexible band whose both ends are wound onto spring-loaded drums. Invention allows to move plasmatron along three coordinates (X,Y, ϕ) independently one upon another in large-area zone of maintenance. EFFECT: enlarged functional possibilities of installation. 2 cl, 6 dwg