FIELD: polymer materials. SUBSTANCE: film polymer is formed directly from monomer by polymerization thereof from electron beam-affected vapor phase. Process is effected pressures of monomer vapors between 1 and 30 Torr, electron beam energies between 5 and 100 kev, and electron beam current intensities between 0.5 and 20 mcA. Under these conditions, film growth velocity achieves 1-1000 nm/min with emission energy performance factor 1-5%. Method can be used in electronics and in medical engineering. EFFECT: accelerated polymerization process. 2 cl, 5 ex
| Title | Year | Author | Number | 
|---|---|---|---|
| METHOD FOR APPLYING HIGHLY HEAT-STABLE THIN FILMS MADE OF POLYTETRAFLUOROETHYLENE ON SURFACE OF SOLID BODY | 2004 | 
 | RU2304588C2 | 
| METHOD OF APPLYING HIGH-RESOLUTION IMAGE OF FUNCTIONAL LAYERS BASED ON THIN POLYMER FILMS ON THE SURFACE OF SOLIDS | 2002 | 
 | RU2247127C2 | 
| METHOD FOR THERMORADIATION TREATMENT OF POLYTETRAFLUOROETHYLENE PRODUCTS | 2001 | 
 | RU2211228C2 | 
| FILM PLASTIC SCINTILLATOR | 1999 | 
 | RU2150128C1 | 
| METHOD OF DETERMINATION OF CONTENT OF IMPURITY IN CRYSTALLINE SILICON | 1991 | 
 | RU2013821C1 | 
| FILTERING MATERIAL | 2000 | 
 | RU2188693C2 | 
| 9-DIETHYLAMINO-3-METACRYLOYLOXY-5H-BENZO[A]PHENOXAZINE-5- DICYANOGEN METHYLENE AS A THERMAL SPRAYING PHOTORESIST FOR DRY LITHOGRAPHY | 0 | 
 | SU1556076A1 | 
| METHOD FOR PRODUCING CARBON NANOSTRUCTURES | 2003 | 
 | RU2228900C1 | 
| PROCESS OF MANUFACTURE OF MESOTAXIAL LAYERS OF COBALT DISILICIDE IN SILICON | 1990 | 
 | SU1795821A1 | 
| METHOD FOR PRODUCING POLYMER MATERIALS CONTAINING PARTICLES OF METALS AND METAL OXIDES WITHIN NANOMETRIC SIZE RANGE | 1996 | 
 | RU2106204C1 | 
Authors
Dates
2002-10-10—Published
2000-06-19—Filed