FIELD: radiation-sensitive photoresist compositions. SUBSTANCE: photoresist composition includes photoinitiator generating acid, solvent, solving inhibitor (not necessary) and polymer containing repeating polycyclic units carrying acidic-labile groups with molecular mass from 500 to approximately 1000000 which is product of polymerization of polycyclic monomers substituted by at least one acidic-labile group and not necessarily in combination with monomer selected from group including maleic anhydride, carbon monoxide, polycyclic monomer substituted by carboxyl group, alkyl-replaced polycyclic monomer and their mixtures. Acidic photoinitiator generates acid when exposed to radiation from source forming image which decomposes side acidic-labile groups and leads to change of polarity of polymer. Polymer acquires solubility in aqueous solution of base in points exposed to radiation from source forming image. EFFECT: compatibility with general scheme of chemical amplification and transparency to short- wave radiation forming image. 35 cl, 2 tbl
