FIELD: light-sensitive materials. SUBSTANCE: invention provides radiation-sensitive photoresist composition containing acid photoinitiator, optionally dissolution inhibitor, and copolymer, which contains at least two itineration polycyclic motifs, one of which bears side acid-labile group and the other side polar function. When irradiated by image-forming emission source, photoinitiator releases acid cleaving side acid-labile groups giving rise to reverse of polymer polarity, as a result of which polymer acquires solubility in basic water solution in sites exposed to image-forming emission source. EFFECT: enhanced image-forming effect. 29 cl, 1 tbl, 74 ex
