FIELD: vacuum deposition of coatings by spraying on coiled materials; applicable in making of functional coatings in manufacture of electronic components, magnetic carriers of recording devices or decorative coatings in various engineering fields. SUBSTANCE: ballast gas flowing from space between film and drum is pumped to high-vacuum chamber by means of sluice system surrounding cooling chamber. Ballast gas pressure is maintained between film and drum at level of 103...104 Pa. Film tension force is selected so that film pressure on drum and ballast gas pressure are close in value. Ballast gas is sued in form of helium. Maintained in sluice chamber is ballast gas pressure of 10 Pa. EFFECT: higher efficiency of coating application due to increased spraying rate from evaporator with simultaneous improvement of film cooling. 5 cl, 3 dwg
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Authors
Dates
2003-07-20—Published
2000-04-10—Filed