FIELD: micromechanical accelerometers suspended from sensing masses. SUBSTANCE: method includes making masking areas during photolithographic application of pattern on source mask-programmable chip at mating points between flexible member with frame and sensing mass whereupon chip is subjected to anisotropic etching. The result is that corners at mating points between flexible member with sensing mass and device frame are rounded off and voltage concentrators are not formed. EFFECT: enhanced mechanical strength of device. 1 cl, 2 dwg
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