FIELD: instrument engineering.
SUBSTANCE: invention relates to instrument-making and can be used in making silicon resilient elements of micromechanical sensors, such as pressure, acceleration and angular velocity sensors. In the method of forming shaped silicon structures, which consists in forming a relief by alternating anisotropic and isotropic methods of etching a silicon structure, after anisotropic and isotropic etching, a thin layer is removed by thermal oxidation and removal of silicon oxide from the obtained relief.
EFFECT: invention increases quality factor of micromechanical elastic elements by forming a relief with a surface structure maximally close to ideal crystalline surface with no defects of its surface.
1 cl, 4 dwg
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Authors
Dates
2020-08-17—Published
2019-12-20—Filed