FIELD: measurement of surface profiles.
SUBSTANCE: the method consists in obtaining of a set of interferograms of the surface under examination at scanning of it by a low-coherent radiation source and recreation of the original profile of the surface under examination with the aid of them. At obtaining of each main interferogram an additional interferogram is read off at a shift of the bearing surface by a fractional part of the wavelength, after that the signal of the additional interferogram is subtracted from the signal of the main interferogram and a differential interferogram is obtained, and the original profile of the surface under examination is recreated from the obtained differential interferograms.
EFFECT: enhanced quality of interferograms due to localization of the zone of interference on the surface under examination.
4 cl, 6 dwg
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