FIELD: development of digital and analog devices.
SUBSTANCE: included in addition into signal-processing photodetector CMOS cell that has four components each incorporating photodiode and restoring MOS transistor and input of source follower are addition n+ region, additional restoring transistor, and two circuits with multiple-gate MOS structures, each incorporating two double-gate structures, coupling gate, and n+ injection region charge-coupled with channels of two first gates of these structures. First circuit has first gate of first multiple-gate MOS structure and second gate of second multiple-gate MOS structure interconnected and connected to photodiode of first component, as well as first gate of second multiple-gate MOS structure and second gate of first multiple-gate MOS structure interconnected and connected to photodiode of fourth component. Second circuit has first gate of first multiple-gate MOS structure and second gate of second multiple-gate structure interconnected and connected to photodiode second components, as well as first gate of second multiple-gate MOS structure and second gate of first multiple-gate MOS structure interconnected and connected to photodiode of third component. Coupling gate in each circuit is inserted between second gates of structure and addition n+ region whose output is connected to input of source follower and to source of additional restoring transistor whose gate is connected to power bus.
EFFECT: provision for implementing circuit discrimination function on pattern in proposed photodetector cell.
1 cl, 3 dwg
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Authors
Dates
2005-05-20—Published
2003-09-08—Filed