FIELD: electrical engineering; surface treatment of phosphor particles.
SUBSTANCE: proposed method that can be used for encapsulating phosphor particles to enhance their lighting and servicing parameters by producing continuous silicon dioxide film on their surfaces includes treatment of phosphor particles with 0.5 and 4 mass percent sols of polysilicic acid synthesized by hydrolyses of tetraethoxysilane in 0.6 - 0.8 mass percent aqueous solution of ammonia.
EFFECT: enhanced lighting parameters and service life of phosphor.
2 cl, 3 tbl
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|---|---|---|---|
| METHOD FOR APPLYING PROTECTIVE FILM ON SURFACE OF PHOSPHOR DOTS | 2016 |
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