DENTAL IMPLANT Russian patent published in 2005 - IPC

Abstract RU 2262324 C2

FIELD: medical engineering.

SUBSTANCE: device has extraosseous part and intraosseous part having pericervical part and apical threaded part. The implant has thread profile height equal to 0.1-0.15 mm with thread pitch equal to 0.2 to 2.0 mm. Lateral sides of thread pattern make an angle of 15-60°. One system of implants combines various versions of implant embodiment(varied diameter, thread pitch, profile height).

EFFECT: high fixation quantity; accelerated treatment course; improved esthetic properties.

18 cl, 10 dwg

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RU 2 262 324 C2

Authors

Abdullaev F.M.

Abdullaev K.M.

Abdullaev R.A.

Dates

2005-10-20Published

2002-12-17Filed