FIELD: semiconductor magnetic field sensors.
SUBSTANCE: proposed Hall-effect magnetic field sensor has arsenide-gallium chip incorporating semi-insulating substrate, magnetically sensitive epitaxial n layer, current and potential contacts; thickness of magnetically sensitive later (d) is specified in the range of d = (0.2 - 1.5) μv and mean concentration of electrons (n) in mentioned layer is chosen from following expression: n·d=(3,3-20)·1011 cm2.
EFFECT: enhanced specific magnetic sensitivity without noticeable increase in residual voltage and noise level or reducing operating stability.
2 cl, 1 dwg
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Authors
Dates
2005-10-20—Published
2004-05-27—Filed