ELECTROSTATIC HOLDER FOR USE IN HIGH-TEMPERATURE-TREATMENT VACUUM CHAMBER, METHOD FOR SUBSTRATE TREATMENT, AND EXPANSION UNIT OF ELECTROSTATIC HOLDER Russian patent published in 2007 - IPC H01L21/68 

FIELD: treatment of substrates such as semiconductor wafers.

SUBSTANCE: proposed electrostatic holder designed for use in high-temperature treatment vacuum chamber has holder body incorporating electrostatic locking electrode and heating element, electrode being capable of substrate electrostatic locking on outer surface of holder body; heat-transfer casing separated from holder body by high-pressure chamber disposed between holder body and heat-transfer casing which are spaced through certain distance apart, heat-transfer casing being used to transfer heat from holder body through heat-conducting gas of high-pressure chamber; and expansion unit attached through detachable joint that joins outer periphery of holder body with heat-transfer casing; expansion unit functions to coordinate different degrees of thermal expansion of holder body and heat-transfer casing. Method for substrate treatment and expansion unit of electrostatic holder are also given in invention specification.

EFFECT: improved design of holder meeting cyclic heat load requirements.

30 cl, 6 dwg