FIELD: technological processes.
SUBSTANCE: invention is related to technology of preparation of thin metal films on solid-state bases. Invention may be used in electronic industry in production of semi-conducting instruments, in material science and crystal physics during research of thin films structure. Method includes application of water-soluble substance layer on base, then thin metal film with its further separation from base by means of full or partial dissolution of water-soluble substance layer. As water-soluble substance surface-active substances are used. Full or partial dissolution of water-soluble substance layer is carried out by full or partial immersion of base in water. Preparation of thin metal films is performed by means of base immersion in water with its further extraction with metal film. Invention permits to increase quality of prepared metal films surface by means of creation of water-soluble substance layer that is characterised by flawless surface.
EFFECT: increase of prepared metal films surface quality.
5 dwg, 2 ex
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