FIELD: production of ultrathin films of carbon-bearing materials, 0.5μm thick or less, in particular, thin films of polymeric materials. SUBSTANCE: the method consists in formation of films by application of materials of liquid phase on a hard surface. The mentioned liquid phase is formed by material in a fused state or solved in a solvent. Application is performed in a closed space, preferably representing a clean room or closed volume within a production plant. The used materials possess an ability for displaying ferroelectric and/or electret properties after the respective treatment. In the closed space such a total content of moisture is maintained, which corresponds a relative humidity less than 50% in the air volume equal the volume of the closed space at a pressure of 98 kPa. The total content of moisture is maintained due to the exclusion and/or removal of water and vapors of water from at least one of the following objects: liquid phase, hard surface and free volume of the closed space above the hard surface during application of film and its subsequent treatment. The mentioned maintaining of moisture at the preset level is accomplished with due account made for the actual pressure of water vapors in the closed space, as well as the content of water in the liquid phase. EFFECT: provided application of high- quality ultrathin films on a great number of supporting structures, production of films of similar thickness and low level of topographic defects of the surface, series production of thin films.
