METHOD OF PRODUCING THIN METALLIC FILMS Russian patent published in 2006 - IPC C23C14/22 C23C14/16 

Abstract RU 2276697 C2

FIELD: coating materials.

SUBSTANCE: method comprises applying a noble metal layer on the plates made of monocrystalline silicon and separating the layer from the substrate. The monocrystalline silicon is oxidized before the applying of the film. The film is applied by physical or chemical settling. The film is separated from the substrate by complete or partial dissolving of the substrate in floating solution. On dissolving the substrate, the metallic film is set on the surface of the floating solution or set in the other liquid to provide complete elevation of the metallic film by the surface tension.

EFFECT: simplified method.

4 cl, 7 ex

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RU 2 276 697 C2

Authors

Starkov Vitalij Vasil'Evich

Vjatkin Anatolij Fedorovich

Volkov Vladimir Timofeevich

Dates

2006-05-20Published

2004-07-28Filed