DEVICE FOR GAS DYNAMIC SPUTTERING OF POWDER MATERIALS Russian patent published in 2008 - IPC C23C24/04 B05B3/00 

FIELD: metallurgy.

SUBSTANCE: invention refers to metallurgy, particularly to devices of gas dynamic sputtering of powder materials and can be implemented in machine building and other fields of industry to produce coats imparting various properties to treated surfaces. The device includes a sputtering unit made as a supersonic ejector and containing a supersonic nozzle, a unit for input of gas powder mixture and working gas into the nozzle and a control unit; also the device contains a powder feeder, an output of which is connected to the unit of input of gas powder mixture into the nozzle. The unit of input of gas powder mixture contains a central body, which is designed with alternate section along its length, and an axial channel for feeding gas powder mixture into the nozzle; this central body is assembled coaxially to the nozzle. The central body is able to move axially and it forms adjusted subsonic and supersonic circular channels of working gas supply with an interior wall of the nozzle.

EFFECT: expanding functional and process facilities of device for gas dynamic coating of powder materials.

6 cl, 1 dwg