LARGE-SIZED GLASS SUBSTRATE FOR PHOTOGRAPHIC MASK AND MANUFACTURING METHOD, COMPUTER READABLE RECORDING MEDIUM AND METHOD OF EXPOSING PARENT GLASS Russian patent published in 2008 - IPC H01L21/27 C03C19/00 G03F1/14 

FIELD: information technology.

SUBSTANCE: invention pertains to glass substrates with large diameter for making substrates for photographic masks for matrix sides and colour filters in liquid crystal panels on thin film transistors. The large sized glass substrate, from which the substrate of a photographic mask is made, is obtained by removing from it, smoothing removable quantity of material, based on high-altitude material for the substrate in the vertical position, with addition of corrective deformation of the removed quantity, which is calculated based on the arching of the substrate material under its own weight in the horizontal position, deformation of the substrate of the photographic mask, resulting from clamping in the exposure unit, and precise deformation of the bedplate for holding the parent glass. Proposal is also given of the method of making a large sized glass substrate, a computer readable recording medium and a method of obtaining parent glass.

EFFECT: high flatness of substrates.

16 cl, 4 dwg, 1 tbl