FIELD: slides for gobo projectors.
SUBSTANCE: slide manufacturing method includes applying photoresist to a glass blank, preparing a photomask; determining the optimal exposure time for the photoresist; illumination of a coated glass blank through a photomask; development of an illuminated coated glass workpiece in a solution of sodium hydroxide NaOH diluted in distilled water at a temperature of 30°C in the proportion of 7 g of NaOH per 100 ml of distilled water for 20 seconds until the exposed area turns purple; washing the developed glass blank in running water after completion of the development process; etching a coated glass blank in a container with an etching solution; washing the etched slide with water, followed by drying and removing any remaining photoresist.
EFFECT: improved quality of slide manufacturing.
5 cl, 3 dwg
| Title | Year | Author | Number |
|---|---|---|---|
| METHOD FOR PRODUCTION OF GOBO SLIDE USING LASER ENGRAVING | 2023 |
|
RU2801073C1 |
| METHOD OF DEPOSITING PRECISION PHOTOLITHOGRAPHIC PATTERN ON CYLINDRICAL SURFACE OF OPTICAL COMPONENT AND IMAGE CONTACT EXPOSURE DEVICE FOR REALISING SAID METHOD | 2012 |
|
RU2519872C2 |
| METHOD OF PRODUCTION OF RELIEF-PHASE HOLOGRAPHIC PROTECTIVE MARK | 1997 |
|
RU2113357C1 |
| METHOD OF MANUFACTURE OF TEMPLATE | 0 |
|
SU1788532A1 |
| PHOTOPATTERN AND METHOD OF MANUFACTURING THE SAME | 0 |
|
SU1003201A1 |
| METHOD FOR PRODUCING A CONCEALED IMAGE ON PHOTORESIST FILM AND DEVICE FOR REALIZATION OF THE METHOD | 2007 |
|
RU2320104C1 |
| PROCESS OF MANUFACTURE OF RELIEF PATTERNS ON SPHERICAL SURFACES AND GEAR FOR ITS IMPLEMENTATION | 1997 |
|
RU2140623C1 |
| METHOD OF MAKING DIE FOR NANOIMPRINT LITHOGRAPHY | 2011 |
|
RU2476917C1 |
| METHOD OF MAKING METALLIC DRAWING IN GLASS SURFACE LAYER | 2010 |
|
RU2456655C2 |
| METHOD OF PRODUCING MASK ON SILVER HALIDE PLATES | 0 |
|
SU1325396A1 |
