SUTURING TECHNIQUE Russian patent published in 2009 - IPC A61B17/03 A61B17/04 A61B17/11 

Abstract RU 2355333 C2

FIELD: medicine; surgery.

SUBSTANCE: there is used retention nail suture comprising an elongated body, pointed distal ends to penetrate into tissue and set of nails. The nails on the first part of a suture body between the first end and the first position along the suture body make it possible to move the suture relative to the tissue herewith preventing movement of the suture in the direction opposite to the first end. The nails on the second part of the suture body between the second end of the retention suture and the second position along the suture body provide movement in the direction of the second end thus preventing movement in a direction opposite to the second end. The first end of the suture is pushed through the tissue, while the first end advances from the exit point. The first end of the suture spins until the second position along the suture thread body is close to the insertion point of the first end of the retention suture. The second end of the suture is inserted into the insertion point of the first end. The second end of the suture spins while the second position is close to the insertion point of the second end of the suture. After the suture ends are inserted and pushed through of the ends of the suture, manual grouping and tissue advancing relative to the retention suture is combined with the tightening. According to one version, there is used insertion device including a tubular element for the retention suture reposition. The retention suture in one version is delivered through the soft tissue; while in the other version the retention suture is delivered through subepidermal tissue. In special cases of cosmetic operation, face skin is tightened within nasolabial fold, forehead, hips, and mammary gland.

EFFECT: method allows improving tissue fixation reliability ensured by independent retention of the nail suture in tissues and through-tissue delivery techniques.

17 cl, 52 dwg, 2 tbl, 2 ex

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RU 2 355 333 C2

Authors

Kaplan Ehndrju

Ruff Gregori

Leung Dzheffri K.

Megaro Mehtt'Ju A.

Dates

2009-05-20Published

2003-09-26Filed