PLASMACHEMICAL CHAMBER FOR MAKING NITROGEN OXIDE BY DIRECT OXIDATION Russian patent published in 2009 - IPC C01B21/32 

FIELD: processing procedures.

SUBSTANCE: invention refers to nitrogen oxide systems. A plasmachemical chamber for direct nitrogen oxidation in cold nonequilibrium plasma comprises a cylindrical body with a feed gas inlet sleeve, face bottoms, a reaction gas outlet sleeve and an insulated rod radiator connected through the bottom of the body axis. The plasmachemical chamber is characterised that the reaction gas inlet sleeve is tangential, and its axis is inclined to the body cross section plane at the angle β by formula: β = arcsin 0.5(a/D), where a is the longitudinal length of sleeve inside dimension in the longitudinal body sectional plane, D is the internal diametre of the body. The transverse length of the sleeve internal section b is half internal diametre of the case D. The insulator length overlaps apertures of the feed gas inlet sleeve. The bottoms can be supplied with inclined guide surfaces, and the insulator comprises spiral edge guides.

EFFECT: more homogeneous composition of reaction products and higher portion of nitrogen oxide.

7 cl, 4 dwg