SILICON HYDRIDES PROCESS Russian patent published in 2009 - IPC C01B33/04 

FIELD: chemistry.

SUBSTANCE: invention can be used in chemical and electronic industry. Silicon hydride monosilane is resulted from reaction of magnesium silicide and mineral acids. Magnesium silicide is prepared by thermal reaction of the mixture containing disperse silicon oxide particles 1 wt fractions, silicon particles to 10 wt fractions, and bulk magnesium 3.5 to 4 wt fractions in continual stirring. Silicon oxide particle size does not exceed 3 mm, and silicon oxide particle to bulk magnesium size ratio is 1:(10-20). Reaction in stirring is performed at temperature interval 550 - 680°C.

EFFECT: extended raw materials base of monosilane process and cost reduction.

3 cl, 1 ex