LITHOGRAPHY METHOD AND DEVICE EXPLOITING RADIATION FAR-UV REGION Russian patent published in 2009 - IPC G03F7/20 

FIELD: production processes.

SUBSTANCE: proposed method serves to plot images on an object (OBJ) and comprises a flat surface arranged perpendicular to radiation a light sensitive zone (PR). Aforesaid object may move crosswise relative to this radiation. The radiation intended for photo lithography comprises, at least, one line in the far-UV range and consists of N consecutive running pulses, their FUV-radiation surface power being measured after this radiation passed through radiating window. The FUV-radiation pulses are produced by exciting an appropriate target with the help of, at least, two laser beams running out from pulsed laser sources selected from a set. Each laser set radiates, on every switching on, a laser pulse with energy (Q) and preset duration (Δt), the laser sources being focused at the same point on target. The proposed method comprises the following reiterative stages within the limits of one n^-th repetition: a) integrating the surface power of FUV-radiation that passed through radiating window in n-1 of the last pulses; b) translational movement of the light sensitive object at the distance equal to 1/N-th fraction of radiating window width (L) along the translation axis; c) subtracting the integral obtained at the stage (a) from the amount of power (W_tot) required for photo lithography; d) determining the amount of power to be generated to produce (W_tot); e) computing the number of laser pulses to be generated to n^-th running pulse; f) determining the appropriate number of laser sources intended for switching on and selecting the laser sources in the amount equal to integer of the said number; g) synchronous switching on of laser sources selected at the stage (e) and reiterating stages (a) to (f) for the nest running point.

EFFECT: method efficient in continuous operation, error in determining exposure dose not exceeding 0,1% or smaller.

16 cl, 6 dwg