FIELD: physics.
SUBSTANCE: invention relates to sources intended for generation of vacuum ultraviolet (VUV) radiation in gas discharge plasma. Generator of radiation with wavelength of 11.2 nm ±1% of discharge plasma in xenon gas contains a nozzle of a gas inlet system located inside a vacuum chamber with a characteristic transverse dimension less than a millimetre, which forms a "point" source of extreme ultraviolet radiation, which is located at the focus of the Bragg mirror. Nozzle of the gas injection system is made with a pointed metal end located near the focus of the Bragg mirror. Sharpened end of the nozzle is connected to a high-voltage wire, which provides the possibility of supplying it with high constant voltage, which is sufficient for occurrence and maintenance of a discharge near the nozzle edge, directly in the area of sharply inhomogeneous pressure drop.
EFFECT: possibility to control emission parameters of plasma by varying such parameters as gas pressure in nozzle inlet and voltage on it, simplification of source design.
1 cl, 1 dwg
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