METHOD OF MAKING PHOTOSENSITIVE STRUCTURE Russian patent published in 2009 - IPC H01L31/18 

Abstract RU 2373609 C1

FIELD: physics.

SUBSTANCE: method of making a photosensitive structure involves anodising a substrate with a working area with given type of conductivity, in an electrolyte with formation of a layer of anodised material of the working area on its surface. Further, on the working area, regions with a different type of conductivity are formed, forming photodiodes. According to the invention, after formation of a layer of anodised material of the working area, thermal treatment is carried out under conditions which provide for simultaneous decrease of built-in charge in the layer of anodised material and elimination of excess mercury from it, or a substrate is chosen first, with a working area whose type of conductivity is opposite the given. After formation of a layer anodised material of the working area, thermal treatment is carried out under conditions which provide for simultaneous decrease of built-in charge in the layer of anodised material and elimination of excess mercury from it, and the type of conductivity of the working area is replaced with the given type of conductivity at the same time.

EFFECT: wider temperature range towards the increasing temperature side, used in processing procedures, increased thermal stability of the structures, as well as improved quality of electrical passivation of the surface of the working area by reducing built-in charge in the anode oxide layer and elimination of excess mercury from it during thermal treatment.

13 cl, 4 dwg

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RU 2 373 609 C1

Authors

Varavin Vasilij Semenovich

Predein Aleksandr Vladilenovich

Remesnik Vladimir Grigor'Evich

Sabinina Irina Viktorovna

Sidorov Georgij Jur'Evich

Sidorov Jurij Georgievich

Dates

2009-11-20Published

2008-09-04Filed