FIELD: physics, semiconductors.
SUBSTANCE: invention relates to superconducting thin-film material and a method of making the said material. According to the invention, the superconducting thin-film material (1) has a textured metal substrate (10) and an oxide superconducting film (30) formed on the said textured metal substrate (10). The oxide superconducting film (30) has a physical vapour deposition layer (31) and an organometallic compound deposition layer (32) formed on the said physical vapour deposition layer. Several structures are superimposed on each other in the said superconducting film (30), where the said structures consist of a combination of the said physical vapour deposition layer and the said organometallic compound deposition layer (32).
EFFECT: achieving an excellent property such as high current density, reduced expenses on superconducting thin-film material.
7 cl, 22 dwg, 5 ex
