FIELD: chemistry.
SUBSTANCE: textured substrate contains layer of textured metal on at least one side, which includes layer of copper, which has cubic texture, and layer of nickel, which is 100-20000 nm thick, formed on copper layer; layer of nickel has 1-30 nm thick nickel oxide layer, formed on its surface, with nickel layer additionally including palladium-containing area, formed of palladium-containing nickel, on the surface of separation with nickel oxide layer. Upper layer of textured substrate, i.e. nickel oxide layer, has surface roughness approximately 10 nm or lower. Ultra-thin nickel oxide layer produces improved impact on growth properties and adhesion of epitaxial film.
EFFECT: substrate has crystalline orientation, providing possibility to form high-quality epitaxial film on its surface.
11 cl, 4 tbl
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| METHOD TO MANUFACTURE SUBSTRATE FOR HIGH-TEMPERATURE THIN-FILM SUPERCONDUCTORS AND SUBSTRATE | 2011 |
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RU2629136C2 |
