METHOD FOR PRODUCTION OF FERROMAGNETIC SILICON FOR ITEMS OF SPINTRONICS Russian patent published in 2010 - IPC H01L21/20 

FIELD: electric engineering.

SUBSTANCE: method for production of ferromagnetic silicon for items of spintronics consists in alternating deposition of silicon and 3d transition metal layers onto substrate in vacuum, at the same time deposition is carried out from laser plasma produced by pulse laser evaporation of targets made of according material. Substrate is installed in peripheral part of evaporated materials flows, and deposition of layers is carried out in process of mutual displacement of targets and substrate versus each other. Thickness of spayed layers and relative content of metal are controlled by variation of laser radiation flows at each target. Radiation of each target is carried out by its source of pulse laser radiation, and when one laser installation is used, two independent flows of laser radiation are shaped with the help of optical prisms and focusing lenses.

EFFECT: invention provides for production of ferromagnetic silicon with abnormal Hall effect, with magnetisation signal at room temperature, method cheapening.

6 cl, 3 dwg